ż ӵ . 5 2 23 2.5%(550) 21850 ŷǰ ִ.
ڴ ֱ 3(ŷ ) ֽ ̰ ִ. 29Ϻ (2) ֽļ 64213(ֽļ 0.62%).
ż ֱٿ ѵ ƴϴ. غ ֽ ؿԴ. ż ֽļ 2064814ַ ֽļ 19.94% شѴ. ܱε ÷ȴ. Ⱓ ܱ 0.1% 6.93% 6.83%P ߰, ְ 101% ߴ.
̷ KBڻ ÷ȴٰ 12 24 . 23 12.29%(2722833) (2014 12 16) 0.23%P(23991) ߴ. KBڻ ܿ ο 6.03%(624174, 2014 8 8 ) ϰ ִ.
ūյ ִ. ü (WISEfn) Ǿ 611 196.7%, 159 ȯ ߴ. ؿ 897, 243 ִ ŵν ̾ ߴ. ǻ ġ ֱ 3 ǻ翡 ǥ ġ հ̴.
3б 438 2013 2踦 Ѿ, 114 ȯ(2013 88 ) ߴ. DRAM ̼ȭ ̴. ݵü ̼ȭ ̷ ؼ 뱤 ʼε ӵ Ű ϰ ִ. DPT(Double Patterning Technology) ̼ȭ ö ַ ǰ ִ.
ݵü () Ǵ ȭм縦 ȸ DRAM ̼ȭ ü, Low-K( ), High-K( ), HCDS ü ϰ ִ. Ǵ CVD(Chemoical Vapor Deposition, ȭб) ü ȭ ū ߴ. ڳ 2012 DPT(Double Patterning Technology) ֱٿ HIGH-K 縦 ǰϱ ߴ.
3б High-K 62 5067% ߰, 35% 32%P þ. 2013 ʾҴ Low-K 35, DPT 88% 60 ŵ״.
ֱ 4б ݿ ְ(PER) ROE(ڱںͷ) ȯ ڷ (-) ߴ. ְڻ(PBR) 6.20.
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