̾ ְ ܱ ǰ ־ . 28 11 23 ̾ Ϻ 1.3%(100) 7160 ŷǰ ִ.
5 28 ̾ ְ 8210 ö 52 ְ ߴ. ༼ ȯ, 8 5500 ر ϶ߴ. ݵ ٽ ϶߰, ٽ ݵ ´. ְ ܱ 6 14% ̻ ϰ ִ. Ư 9 ٽ , ܱ 15.08% 15% Ѿ. 5 ʱ ϴ ܱ ̾ 12% .
ܱڴ ̾ CMP(Chemical Mechanical Polishing, ȭ ) ָ δ. ̾ Z, SK̴н Բ CMP ִ. CMP ݵü źȭ Ǵ , ̱ ö̵ Ʈ(Applied Materials) Ϻ ٶ(EBARA) ü 90% ϰ ִ ˷.
̾ 2009 λ 迭 λīκ ݵü μϸ鼭 CMPġ , ߴ. ̾ CMP ȭ ݵü ü.
̷ ݱ ݵüι 809, 170% þ. ̴. Zڴ ȭ DRAM ȯڿ ߱ þ 3 ÷ (3D-NAND) 2 ڸ غϰ ִ ˷. SK̴н DRAM ̼ȭ 3D-NAND ڸ ȹϰ ִ.
ü (WiseFn) ֱ 3 ǻ簡 ̾ 3011 6% þ ̴. ٸ 276, 232 11% ٺô. ȯ CMP þ鼭 2015 ͼ ߴ.
( 0)