ũ ڱֽ ϱ ߴ. Ư ũ ڱֽ 濡 2013 9 2 ̶ . 10 9 26 ũ Ϻ 7.8%(1100) 15100 ŷǰ ִ.
ũ ڻֽ ݾ ְġ ڱֽ 30ָ ȹ̶ . 濹ݾ 433500̸, 濹Ⱓ 2015 7 10 ~ 2015 10 9ϱ. 濹ֽļ ֽļ 1.34% Ը. 濹ݾ 濹ֽļ غ 1ִ 濹ܰ 14450̴.
ũ ڱֽ 濡 2013 9 2 ̴. 2013 10 ֱ 2 ڱֽ óߴ. ֱ ְ , ڱֽ 濡 Ǯ̵ȴ. ũ ְ ϶ϱ ߴ. 14000, 6 25 22% ϶ ̴.
̷ ũ ް ϰ ִ. ũ ް 13, ѱݾ 537̴. ̴ 68.5% ̴(ñ [úм] ũ, 13° ְ...?).
Ǿ 2б ũ ŵ ٺ ִ. 켱 SK̴н, Z ڸ ϰ ִ . ũ(Micron), ũδн(Macronix) ؿ ü ǰ ̴ ̲ ȴ.
Ϲݱ ̴. ũ ̴. þ迡 ũ ALD(Atomic Layer Deposition, ) ߴ. DRAM ̼ȭ ݵü ü ÷ ̼ȭ ϰ ִ. ALD 3 پ ϵ β ڸ , ALD ϰ ִ. ݵü ̼ȭ Ǹ鼭, ALD þ δ.
System LSI(ý ݵü) Ǵ SEG(Selective Epitaxial Growth, ܰ ) ȴ. SEG ̱ ö̵ Ʈ(Applied Materials)簡 , ũ ̸ ȭߴ. ֱ Zڰ ý۹ݵü 14 (FIn-FET) , ý۹ݵü Ź ˷ ȴ.
ٸ ֱ ũ ŵ״. 1б ũ 168, 60% ߴ. 79% پ 24 ߴ.
Ǿ δ ŵ ϰ ִ. ֱ 3 KDB ǻ 6 ũ 1413, 398̴. 80%, 222% ̴.
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