ֱ ̾ ְ ϰ ִ , ܱ ٽ ִ. 3 1 39 ̾ Ϻ 0.7%(100) 13300 ŷǰ ִ.
20 Ѷ 15150 ְ ߴ ̾ 13000 ~ 15000 ̸ ϰ ִ. ̷ ص ̴ ܱ ֱ ִ. Ǿ迡 ܱ 21.41%, ְ ߴ 3.23%P Ȯƴ.
̿ ռ ̾ ֱ ŵ״. 1б 945, 21% þ. 65% 83 ߴ.
κ ι ƴ. 켱 ݵü ι ũ ߴ. 1б ݵü ι 29% 526 ߴ. 62 16% þ. ÷̺ι ͼ ũ ƴ. 1б ÷̺ι 152 3% þ. 11 ȯߴ.
̷ Ǿ ̾ ִ. ݵü ̼ȭ Ǵ ̴. ̿ ̾ CMP(Chemical Mechanical Polishing, ȭ ) þ DZ ̴.
CMP ǥ鿡 ʿϰ ڸ ϰ, źϰ ݵü Ĩ ϱ ٽ ϳ̴. ݵü ̼ȭɼ ϴµ, ̸ źȭ 뱤 ϴ. ֱ ̼ȭ 鼭 3D NAND, FinFET Եǰ , ̿ CMP þ ִ. ̾ CMP ȭ ݵü ü.
̾ CMP ִ ϰ ִ ̴. CMP ϱ ؼ ؾ Ǵµ, ̾ CMP Ҿ ϰ ִ. ݵü ü ڿ ū ݸ, Ѵ.
̳ Ʈ KDB ̾ 4390, 390̴. 23%, 26% ̴.
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