1б ǥ Ͽ ̾ ¼ ϰ ִ. 14 10 44 0.2%(50) 22350 ŷǰ ִ.
ڰÿ 1б ߴ. 1б 188 69.4% ߴ. 48 77.8%, 44 76.0% ߴ. κп б ִ ߴ. ̹ ǻ ġ ġ. ġ(182, ġġ) 3.3%, (44) 9.1%, (32) 37.5% ȸߴ. ġ ֱ 3 ǻ簡 ġ.
Z ݵüι Ǯ̵ȴ. Zڴ 1б 7 ǥߴ. к Z ݵüι 2 Ĺ ŵ ˷. DRAM, NAND ݵü 䰡 ȣ , ι ýLSI ι ũ ٿ δ.
þ迡 (Z, SK̴н ) DRAM 20nm ̼ ȯ ֹ DPT(Double Patterning Technology) ߴ. ǿ V-NAND Ǵ ǰ ߴ.
ݵü ̼ȭ ̷ ؼ 뱤 ʼε ӵ Ű ϰ ִ. DPT ̼ȭ ö ַ ǰ ִ. ʿ ʹ Ḧ Ѵ.
̷ KBڻ ÷ȴٰ 8 ߴ. ڰÿ KBڻ 7 18.16% (2015 3 31) 0.04%P(3579) ÷ȴ. KBڻ 9 5% ̻ ߴٰ ÷Դ.
1б ȯ ݿ ְ(PER) 20.01. ְڻ(PBR) 5.14, ڱںͷ(ROE) 25.69%.
ݵü () Ǵ ȭм縦 ȸ DRAM ̼ȭ ü, Low-K( ), High-K( ), HCDS ü ϰ ִ. Ǵ CVD(Chemoical Vapor Deposition, ȭб) ü ȭ , ū ߴ. ڳ 2012 DPT(Double Patterning Technology) ֱٿ HIGH-K 縦 ǰϱ ߴ.
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