Zڰ ۷ι ұ 13 , ſ ֱ Ȳ ָȴ.
13 Ǿ迡 Zڴ ۷ι ɼ 13 »(Z÷ ) 2015 ұ ߴ. Zڴ 2013 2 19 ó ۷ι ұ 14 ߰, ؿ 10 ߴ.
۷ι ұ ü Եȴ. ̿ ڱ , İ Z پ ´. ұ ü ּҰ ñ ̴.
2013 ұ 2 ְ· 54%...ݵü
2013 Z ұ ̿ũн 11̴. 2014 ְ· 15%, ϱ ֱ 1 ְ· 31% Ҵ.
Ư ݵü ϴ ְ ö. 2013 Ϲݱ Z, SK̴н ݵü ھü ڸ ϸ鼭 δ. 2 ְ· 54% Ѵ.
ݵü ϴ Ư ƴ. ۳ 3б IPS 3550 44% þ. 558 314% ߴ. ǿ, ̿ũн ũ ƴ.
2014 ұ ְ· -12%...Ʈ
2014 Z ұ Ľ Ʈ Ҵ. Z Ʈ ι ϸ鼭 ϴ ְ Ҵ. Z ұ ְ 12% ϶ߴ.
̷ κ ŵ״. ְ ũ ϶ Ľ 3б 2241 63% ް߰, -168 ڸ ߴ.
ش . Zڰ ұ ǻ翡 ġ 11̴. ұ δ. ֱ 3 ǻ簡 ġ 197% 2228, 415% 412̴.
۳ Ϲݱ Zڿ SK̴н ü ڰ ̾ ֱ ݵü ALD(Atomic Layer Deposition, ) ε . 2011 ݵü ALD() ۷ι ݵü ü ؿԴ.
ұ ̾ ȴ. ݵü ü ڰ ̾鼭 CMP(Chemical Mechanical Polishing, ȭ ) þ ̱ ̴. BOE ߱ ÷ ü ڰ ȹ ͵ ̴. ̾ ݵü ݵü Ӹ ƴ϶ FPD . ̿ ݵü Ӹ ƴ϶ ÷ Դ´.
̿ , ǿ, ũ ŵ ȴ.
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