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ݵü ο
ݵü ٽ ALD ü. ݵü
ALD(Atomic Layer Deposition. ) Dry Etcher(ǽ İ) ݵü (2005 ݱ 63%) ¾(Solar Cell, ݱ 20%)) , Ǹ.
ַ ALD ݵü Capacitor ڸ , 簡 1998 ʷ ߿ ѵ, ֿ ھü 200/300mm߽ ο. ALD-Oxide ǰ ߽ , 2004 Ϻ TEL簡ϴ ALD Metal ʷ ȭ ߰, ̸ 2005 ݱ(439) 2004 ü (414) Ѵ ū .
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ALD ݵü ȸμ ̼ȭǸ鼭 90 DZ ߰, 70 Ϸ ̼ȭ Ǹ鼭 Ȯ .ȸ ALD 2006 1 Ը 2004 ι .
ݵü Dry Etcher(ǽ İ )ܿ, ֱ TFT-LCD Dry Etcher ȭ , 2006 ݿ .
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߿ ϱ üη 51% R&Dηαϰ, ų 10~15% R&D ϰ , óϰ. ݵü о ֿ ó Z, ̴н, ǴϿ Ȯϰ , ¾ о߿ Ϻ Kyocera ֿ . ȸ 濵ȹ 9,000 2005, 2006 EPS PER 10.6, 5.1.
밡 38.8%: ִ , 츮(2%) 1 ȣ. ı(9.11%) 1 ȣ . 밡 Ÿ 20.8% ֽ 18% 38.8%, 567.
ְ 12 19 11800 per16.14 EPS768
ַ ΰȴٸ 2006 强κа ְ ϵ Դϴ.
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