ݵü ü ȣ ŵ ݵü ü . 24 2 10 1.9%(400) 2500 ŷǰ ִ.
SK̴н 3б ǥߴ. 3б 43121 5.6% þ. 13012 11.7%, 1953 14.3% ߴ. ι ־ б ִġ ŵ״.
̿ ռ 7 ǥ Z ݵü ι ȣ ŵ״. ݵüι 2 ʹ(21000 ~ 23000) ˷. ݵüι ü ̻ 2011 ó̴.
ֱ ϰ ִ. Ǵ CVD(Chemoical Vapor Deposition, ȭб) ü ȭ ߱ ̴. ڳ 2012 DPT(Double Patterning Technology) ֱٿ HIGH-K 縦 ǰϱ ߴ.
̿ 2б 149 246% ߴ. Ư DPT ǰ 52 164% ߴ. 2б ʾҴ LOW-K( Si ڸ ) HIGH-K(ij۽ ) 45, 27 ߴ.
ش ̼ȭ Ѱ ִ. DRAM NAND ̼ȭ ̷ ؼ 뱤 ʼε ӵ Ű ´. ̿ DPT ̼ȭ ϰ ְ DPT 簡 ǰ ִ. HIGH-K DRAM ̼ȭ Ǹ ij۽ ذϱ 뷮 ϰ ִ .
3б ̴. Ǿ 3б 127 44%, 44 1000% ߴ. 599 191%, 158 ȯ ٺô. ̴ 1.2%, 3.3% ġ. ǻ ġ ֱ 3 ǻ翡 ǥ ġ հ̴.
2б ݿ ȯ ְ(PER) ڱںͷ(PBR) ȯ ڸ (-). ְڻ(PBR) 7.87.
, ֱ KBڻ 8.77%, ο 6.03% ϰ ִ.
մϴ. ش Ȯ ߽ϴ.
ε Ź帳ϴ.